LFGS RF Generators

Photo of LFGS RF Generator

The versatile, variable-frequency LFGS RF generator (1250 W,  40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.

Benefits Features
  • Versatile—suits a wide variety of applications
  • Lowest reflected power commercially available
  • Easy installation
  • Efficient use of valuable space
  • Variable frequency
  • Air cooling
  • Enhanced operating menu  
  • Active front panel
  • Pulse mode (0 to 10 kHz)
  • CEX operation mode
  • 2 analog user ports
  • RS-232, Ethernet, and Profibus communication

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