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Advanced Functionality for Expansion into New Applications
Combining VHF energy and CCP architecture, the Quanta® remote plasma source (RPS) enables sophisticated plasma generation and expansion into new thin-film processes not possible with traditional RPS or in-situ plasma generation.
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Benefits |
Features |
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Expanded ignition and operating range
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Customizable chemistry
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Customized radical mix delivered to your process
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New processes enabled not possible with other plasma sources
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Proven VHF power-delivery technology
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Real-time process parameter reporting: impedance, voltage, power
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Factory-verified chamber matching
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All Al2O3 ceramic internal construction
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Small-footprint source body
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Direct mount to main processing chamber
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Output through standard flange
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Rack-mount VHF generator
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Integrated fixed or selectable matching circuit
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Sweep frequency impedance matching
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Integrated ignition circuitry
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High-purity ceramics on all plasma-wetted surfaces
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Pulsing capable
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